i3N integrates top facilities as required by high level research groups having as objective to be in forefront edge of research, technological development and innovation in the demanded areas of advanced micro/nano materials, nanotechnologies and nanosciences, and being responsible for boosting all known industry/applied research. This involves the use of high powerful computing tools; sophisticated labs for characterization and processing activities, such as clean rooms; use of sophisticated equipment, in some cases highly expensive, such as SEM/FIB or ultra high vacuum units to process materials and devices; use of raw materials, special gases and components, among others.
Laser processing lab is equipped with seven lasers systems that allow to produce functional interfaces and surface engineering, and the growth of single crystals, highly textured materials and nanoparticles. Chemical Vapor Deposition lab is equipped with two CVD reactors to the growth of carbon-based materials, particularly graphene electrodes for neural signals and GFETs biosensors.
The Lab is fully equipped with ionization radiation sources, radiation detectors and medical imaging systems and all the needed equipment for detector development.
Radiation sources including a Radioisotope Laboratory and X-ray facility with 4 X-ray generators (60 kV/60 mA and a 50 kV/1 mA with continues operation; 30 kV solid state generator and; a dentistry generator with 70 kV).
The quality control and food safety laboratory is located at Madeira University and its activities are strongly focused on the development and application of novel advanced purpose-designed optical fiber sensors that can improve the quality control processes in food and beverages industries.
FTIR, absorption/transmission (VUV, UV, VIS, IR), photoluminescence (PL), PL excitation (PLE), time resolved PL (TRPL), lifetimes, excitation density/energy/temperature
Optical and electro-optical characterization of materials, quantum emission yield, colour coordinates, No Lab fs Laser radiance and luminance, Laser printing of Bragg gratings in optical fibers for sensors.
SEM/EDX – The Scanning Electron Microscope (SEM) equipment relies on a TESCAN Vega 3 instrument. It is based on a thermal emission source (W filament), allowing beam energies within the 200 eV to 30 keV range.
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