Description: DC and RF sputtering, e-beam deposition, thermal evaporation, spin-coating, spray-pyrolysis, sintering (furnace, sol-gel, combustion, microwave).

i3N Aveiro | Carbon based materials and laser processing

Laser processing lab is equipped with seven lasers systems that allow to produce functional interfaces and surface engineering, and the growth of single crystals, highly textured materials and nanoparticles. Chemical Vapor Deposition lab is equipped with two CVD reactors to the growth of carbon-based materials, particularly graphene electrodes for neural signals and GFETs biosensors.

Laser Floating Zone (LFZ)

Description – LFZ system is mainly dedicated to the growth of single crystals and polycrystalline textured material (ZrO2, TiO2, ZnO, superconductors, thermoelectric, …), but also eutectic materials and metastable phases. The LFZ equipment includes a laser set-up; a growth chamber; monitoring system (laser parameters, pulling rate and rotation speed) assisted by real time image acquisition. The laser set-up comprises a continuous DC pumped 200 W CO2 laser (Spectron SLC, l = 10.6 μm) with a gaussian profile featuring a Reflaxicon optical arrangement. The growth chamber is sealed, enabling atmosphere-controlled processing.

Pulsed Laser Ablation in Liquid (PLAL)

Description – Nanosecond (7 ns pulse width) Q-switched Nd:YAG laser emitting at 1064 nm wavelength and having a maximum pulse repetition rate of 10 Hz energizes. Under unfocused conditions, the laser beam has a spot diameter of 7 mm and a maximum pulse energy of 685 mJ.  This system is equipped with a multiple nonlinear harmonic crystal generation unit allowing to obtain extra laser lines at 532 nm, 355 nm and 266 nm. PLAL system is mainly dedicated to the synthesis of nanoparticles (metallic (e.g. Au, Ag, Cu, …. ) or ceramic materials (e.g. ZrO2, phosphors, …). Also, materials dispersed in solutions can be exfoliated using PLAL technique (e.g. MoO3, …).

CO2 laser for surface modification/engraving/cutting

Description – CO2 laser emits a power of up to 50 W at the 10.6 µm wavelength in continuous wave regime.
The laser beam is directed through an optical system featuring an optical head attached to an automated XY gantry, achieving a well-focused scribing area of 30 x 50 cm2 at a maximum speed of 500 mm/s. Beam diameter at the focal point ~ 50 µm.
This system is mainly dedicated to surface modifications and cutting of different materials.

UV pulsed laser for surface modification/engraving/cutting

Description – A 5 W pulsed Laser, with a pulse frequency ranging from 10-150 kHz at a fixed wavelength of 355 nm. It is equipped with a galvanometric scanning head with a 16 mm F-θ Lens, allowing the controllable patterning at high speed in a 10×10 cm2 working area.
This system is mainly dedicated to surface modifications, development of functional interfaces and synthesis of new materials.

CO2 pulsed laser for surface modification/engraving/cutting

Description – Pulsed CO2 laser (?= 10.6 µm; 80 W), with a pulse frequency of 0.5 to 100 kHz, the laser beam is directed through a galvanometric head with an F-theta lens along the XY plane in a recording area of 100 x 100 mm2 at a maximum speed of 6000 mm/s.
This system is mainly dedicated to surface modifications, development of functional interfaces and synthesis of new materials.

Pulsed Fiber Laser for surface modification/engraving/cutting

Description – MOPA Pulsed Fiber Laser (λ = 1064 nm; 100 W), with a pulse frequency of 1 to 4000 kHz and pulse duration from 10 to 500 ns. The laser beam is directed through a galvanometric head with an F-theta lens along the XY plane in an area of recording of 110 x 110 mm2 at a maximum speed of 6000 mm/s.
This system is mainly dedicated to surface modifications, development of functional interfaces and formation of new materials.

Pulsed Green Laser for surface modification/engraving/cutting

Description – Nanosecond pulsed green laser (λ = 532 nm; 10 W), with a single-pulse pulse frequency up to 150 kHz (10 ns duration). The laser beam is directed through a galvanometric head with an F-theta lens along of the XY plane in a recording area of 100 x 100 mm2 at a maximum speed of 6000 mm/s. This system is mainly dedicated to surface modifications,  development of functional interfaces and formation of new materials.

Picosencond UV laser for surface modification/engraving /cutting

Description – A 10 W 10ps UV (355 nm) MOPA laser with two possible outputs: A 3D galvo head system that allows to create 3D designs on surfaces or inside transparent materials, and a direct output to be connected to microscope lenses, allowing high resolution micropatterning. It works on different types of materials to promote micro and nanometric changes with different topographies and therefore different surface properties.
This system is mainly dedicated to surface modifications, development of functional interfaces and synthesis of new materials.

Microwave Plasma Chemical Vapour Deposition (MPCVD)

Description – A high-power microwave magnetron is coupled trough a rectangular profile waveguide and an antenna to a cylindrical growth chamber.
MPCVD with 6 kW microwave max. power and is mainly dedicated to the synthesis of carbon allotropes (graphene, carbon nanotubes (CNTs) and diamond films).

Thermal Chemical Vapor Deposition (TCVD)

Description – TCVD reactor is able for reaching temperatures of up to 1200°C through resistive heating. It is composed of two coaxial quartz tubes (diameter: 75 mm inner tube and 95 mm outer tube; length: 1400 mm inner tube and 1500 outer tube), allowing deposition either between the tubes or in the inner one.
The system is equipped with a gas supply of argon, hydrogen and methane, and is capable of growing graphene at either atmospheric or low pressure, with the latter achievable using a roots-type dry pump.

Profilometer

Description – Profilometer using chromatic dispersion technology. It allows to extract surface profiles (textures and topographies) with a lateral resolution of up to 1.7 um in large working area (150 x 200 mm2) and with a capture depth of up to 3 mm (which can be increased by multiple passes).

Potentiostat/Galvanostat

Description – Four-channel device for impedance spectroscopy (100 kHz – 10 µHz), Mott-Schottky analysis and several variants of voltammetry, amperometry, potentiometry and coulorimetry. Bi-potentiostat (for e.g. ion-sensitive and bioFET testing) and iR drop correction capabilities. It allows very sensitive measurements (5 fA resolution on the 100 pA range), adequate for micro/nanosensors and other small current magnitude applications. Channels can be synchronized and each channel can be extended by the multiplexer to allow 8 automated series measurements.

Potentiostat/Galvanostat

Description – Single channel device for impedance spectroscopy (1 MHz – 10 µHz) Mott-Schottky analysis and several variants of voltammetry, amperometry, potentiometry and coulorimetry. IR drop correction capability. The +/- 12 V potential range and 650 mA max current allows for testing electrode and electrolyte materials for most electrochemical applications, including sensors, catalysis and bulk electrolysis, as well as electrochromic devices and energy storage devices such as small batteries and coin cells.

Spectrometer VIS-NIR

Description – Flex Spec spectrometer with a wavelength range of 360 to 1100 nm, the optical resolution is 0.6 nm with a 10 μm slits. The system is equiped with a Y-Probe, in which is possible to characterize the diffuse and specular reflection.
Also, with an integrating sphere the signal to noise racio is increased making it possible to characterize low reflective samples.

Optical power meter with fan cooled S322C thermal power sensor head

Description – Power and energy meter interface with USB operation with
fan cooled S322C thermal power sensor head
Wavelength Range: 250 nm – 11 µm
Optical Power Range: 100 mW – 200 W
Active Detector Area: Ø25 mm
Max Optical Power Density: 4 kW/cm²
Resolution: 5 mW

Raman spectrometers (532 and 785 nm)
Description – Micro-Raman system with two laser lines 532 and 785 nm. This integrated micro-Raman system with optical fiber coupling is coupled to a microscope and allows to quickly obtain structural information from various types of samples.

Van der Pauw system for sheet resistivity
Description – A probe fixture connected to a multiplexer interface and a Keysight B2902A to perform 4-proble sheet resistance measurements.

FLIR A310 Thermal Camera
Description – Thermal Camera with a 320 x 240 resolution able to detect temperature differences down to 50 mK, with a field-of-view of 25°x 18.8°.